- Mass Spectrometry for Energy Transformation and Astrochemistry
- Extreme Ultraviolet Electronic Structure Characterization and Lithography
- Electronic Structure Characterization for Operando Micro/Nano Devices
- High-sensitive, Space-Resolved and Time-Resolved Electron Spin Dynamics
- In-situ/Operando Soft X-ray Spectroscopy and Scattering
- Soft X-ray Ptychographic Nanoscopy
- Resonant Coherent Scattering
- High Throughput In-situ/Operando Tender X-ray Spectroscopy
- Tender X-ray Spectromicroscopy and Ptychography
- Test Beamline
Key Performance
The beamline is sourced by an elliptically polarizing undulator (EPU120). A cylindrical mirror M1 collects the diverging beam from the undulator and horizontal focus the beam to the exist slit-H. The monochromator is Plane Grating Monochromator type, consisting a plane mirror M2 and two different variable line spacing (VLS) gratings. The monochromator energy-disperses VUV-light, which is then focused vertically to the exist slit-V by the VLS gratings. Monochromatized X-ray beam is switchable into two branches by the plane mirror M5. At Branch A, VUV-beam light is refocused by a KB mirror set to a sub-micro size.
