2016-09-06  Font Size:[ Large Medium Small ]

Technical information:

Photon source

Bending magnet

Energy range

100 -1000 eV

Energy resolving power (E/ΔE)


Photo Flux

~1x1010 phs/s

Beam size

<~1 x 0. 8mm2

Spectrometer resolution

5 0meV



Synchrotron radiation photoemission spectroscopy (SRPES, including ARPES),
X- X-ray photoelectron spectroscopy (XPS),
resonant photoemission spectroscopy (RPES),
near-edge X-ray absorption fine structure (NEXAFS),
low energy electron diffraction (LEED) .


Endstation facilities

Analysis chamber:

VG SCIENTA R3000 electron analyzer,Twin Anode X-ray source (Al Ka), LEED optics, Variable temperature four freedom manipulator (X,Y,Z,q, temperature range: 90-1400 K), flood gun. Base pressure: < 5x10-10 torr. 

Preparation chamber:

Four freedom manipulator (X,Y,Z,q) on which sample temperature can be varied from 90-1400 K, ion sputter gun, metal evaporators, quartz crystal microbalance (QCM). RGA(residual gas analyzer). Base pressure: <5 x 10-10 torr.



Sample temperature range of 100-950 K, Pressure 20MPa , Two way gas controller.



Two samples can be loaded at same time


Research Areas
Heterogeneous catalysis: surface structure and reaction mechanism
Surface composition and electronic structure of metal, oxide and polymer films
Surface and interface electronic structure of semiconducting organic films
Surface structure and molecular orientation of self-assembly monolayers
Surface and interface analysis of solid state functional materials


Haibin Pan
Tel: 0551-63602115

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