Technical information:
Photon source |
Bending magnet |
Energy range |
100 -1000 eV |
Energy resolving power (E/ΔE) |
1000@244eV |
Photo Flux |
~1x1010 phs/s |
Beam size |
<~1 x 0. 8mm2 |
Spectrometer resolution |
5 0meV |
Function
Synchrotron radiation photoemission spectroscopy (SRPES, including ARPES),
X- X-ray photoelectron spectroscopy (XPS),
resonant photoemission spectroscopy (RPES),
near-edge X-ray absorption fine structure (NEXAFS),
low energy electron diffraction (LEED) .
Endstation facilities
Analysis chamber:
VG SCIENTA R3000 electron analyzer,Twin Anode X-ray source (Al Ka), LEED optics, Variable temperature four freedom manipulator (X,Y,Z,q, temperature range: 90-1400 K), flood gun. Base pressure: < 5x10-10 torr.
Preparation chamber:
Four freedom manipulator (X,Y,Z,q) on which sample temperature can be varied from 90-1400 K, ion sputter gun, metal evaporators, quartz crystal microbalance (QCM). RGA(residual gas analyzer). Base pressure: <5 x 10-10 torr.
REACT:
Sample temperature range of 100-950 K, Pressure 20MPa , Two way gas controller.
Load-lock:
Two samples can be loaded at same time
Research Areas
Heterogeneous catalysis: surface structure and reaction mechanism
Surface composition and electronic structure of metal, oxide and polymer films
Surface and interface electronic structure of semiconducting organic films
Surface structure and molecular orientation of self-assembly monolayers
Surface and interface analysis of solid state functional materials
Contact
Haibin Pan
Tel: 0551-63602115
Email:hbpan@ustc.edu.cn