Function

High resolution synchrotron radiation photoemission spectroscopy (HR-SRPES, including ARPES)，high resolution X-ray photoelectron spectroscopy (HRXPS), resonant photoemission spectroscopy (RPES), near-edge X-ray absorption fine structure (NEXAFS), low energy electron diffraction (LEED), and reflection high-energy electron diffraction (RHEED)

Endstation facilities

Analysis chamber：VG SCIENTA R4000 electron analyzer，Monochromatic X-ray source (Al Ka), LEED optics, Variable temperature five freedom manipulator (X,Y,Z,q, j, temperature range: 90-1400 K), flood gun. Base pressure: < 7x10^-11 torr.

Preparation chamber：Four freedom manipulator (X,Y,Z,q) on which sample temperature can be varied from 90-2000 K, ion sputter gun, metal evaporators, quartz crystal microbalance (QCM). Base pressure: <1 x 10^-10 torr.

MBE：Two freedom manipulator (Z,q) with sample temperature range of 90-1300 K, QCM, RHEED. Base pressure: <5 x 10^-10 torr.

Load-lock：Two samples can be loaded at same time

Research Areas

• 　  Heterogeneous catalysis: surface structure and reaction mechanism
• 　  Surface composition and electronic structure of metal, oxide and polymer films
• 　  Surface and interface electronic structure of semiconducting organic films
• 　  Surface structure and molecular orientation of self-assembly monolayers
• 　  Surface and interface analysis of solid state functional materials

Contact

Junfa Zhu

Tel: 0551-63602064