Catalysis and Surface Science
 2015-01-29  Font Size:[ Large Medium Small ]
Technical Information

 Photon source  Undulator
 Energy range  20 -600 eV
 Energy resolving power (E/ΔE)  10000@29eV
 Photo Flux  > 5x1010 phs/s
 Beam size  < 0.2 x 0.1 mm2
 Spectrometer resolution  5 meV @ 20 eV



High resolution synchrotron radiation photoemission spectroscopy (HR-SRPES, including ARPES)high resolution X-ray photoelectron spectroscopy (HRXPS), resonant photoemission spectroscopy (RPES), near-edge X-ray absorption fine structure (NEXAFS), low energy electron diffraction (LEED), and reflection high-energy electron diffraction (RHEED)


Endstation facilities

Analysis chamberVG SCIENTA R4000 electron analyzerMonochromatic X-ray source (Al Ka), LEED optics, Variable temperature five freedom manipulator (X,Y,Z,q, j, temperature range: 90-1400 K), flood gun. Base pressure: < 7x10-11 torr.

Preparation chamberFour freedom manipulator (X,Y,Z,q) on which sample temperature can be varied from 90-2000 K, ion sputter gun, metal evaporators, quartz crystal microbalance (QCM). Base pressure: <1 x 10-10 torr.

MBETwo freedom manipulator (Z,q) with sample temperature range of 90-1300 K, QCM, RHEED. Base pressure: <5 x 10-10 torr.

Load-lockTwo samples can be loaded at same time


Research Areas

  •    Heterogeneous catalysis: surface structure and reaction mechanism
  •    Surface composition and electronic structure of metal, oxide and polymer films
  •    Surface and interface electronic structure of semiconducting organic films
  •    Surface structure and molecular orientation of self-assembly monolayers
  •    Surface and interface analysis of solid state functional materials



Junfa Zhu

Tel: 0551-63602064


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